用于监测在等离子体工序中产生的电弧现象的rf信号监测装置及系统

요약

The present invention relates to an RF signal monitoring system. The RF signal monitoring system comprises: an RF sensor connected to a lower electrode on which a substrate is disposed in a chamber of a plasma processing apparatus to sense a characteristic value of an RF signal generated from the upper electrode and affecting the substrate; and an RF signal monitoring apparatus connected to the RF sensor to monitor abnormalities or changes in an RF signal sensed by the RF sensor. The RF signal monitoring apparatus comprises: an RF output unit configured to output the characteristic value of the RF signal sensed from the RF sensor as a signal pattern of time series data or image data on a display; a detection unit configured to detect an RF signal pattern outputted to the RF output unit based on an RF signal pattern model learned by a time series data or image-based deep network and detect abnormalities or changes in the detected signal pattern; an extraction unit configured to extract, when an abnormality or change is detected in the RF signal pattern, the characteristic value of the RF signal at a point wherein the abnormality or change is detected; and a data management unit configured to store and manage the characteristic value of the RF signal at the point wherein the abnormality or change is detected as abnormal data.